Date of Award
Master of Arts
Dr. Asghar N. Kayani
Dr. Paul Pancella
Dr David Schuster
Hydrogen energy, PVD system, hydrogen thermal stability, ion beam analysis, magnesium hydride
Masters Thesis-Open Access
The thermal stability of Ni/MgH thin film deposited on Si substrate by Unbalanced Magnetron Physical Vapor Deposition has been investigated using Ion Beam analysis (DBA) techniques. Rutherford Backscattering Spectrometry (RBS) and Non-Rutherford Backscattering Spectrometry (NRBS) have been used to find the composition of Magnesium, Nickel and Oxygen. Elastic Recoil Detection Analysis (ERDA) has been used to determine the concentration of hydrogen at each level of heating. Heating was done in the Ultra High Vacuum (UHV) environment using a non gassy button heater. Ni/MgH sample had lost most of its hydrogen after being heated to a temperature of about 125°C in vacuum. However, the onset temperature of hydrogen loss from the sample was found to be within 21°C and 50°C. The interface regions between the film and the substrate and between Ni and MgH layers were unaffected by this operation.
Taibu, Rex Nyadaufe, "The Variation of Hydrogen Concentration in Ni/MgH Thin Film with Temperature" (2012). Masters Theses. 60.