Date of Award
12-1987
Degree Name
Master of Arts
Department
Physics
First Advisor
Dr. Stephen Ferguson
Access Setting
Masters Thesis-Open Access
Abstract
Rutherford Backscattering Spectroscopy with channeling is the only nondestructive method for analyzing crystals which have been ion implanted. An RBS with channeling procedure has been established at the Accelerator Lab of Western Michigan University. It utilizes a tandem Van de Graaff accelerator for an incident helium beam, a goniometer for crystal alignment, and a computer for experimental control and data aquisition. State of the art measurements can be made with accuracies comparable to other labs. Specifically, ion implanted silicon was studied wherein crystal damage due to implanting was found to vary directly with implanting energy and fluence and was also reduced by subsequent annealing. Further research efforts will find this experimental setup very productive.
Recommended Citation
Pollock, Thomas J., "A Study of Ion Implanted Silicon Using Rutherford Backscattering Spectroscopy with Ion Channeling" (1987). Masters Theses. 1245.
https://scholarworks.wmich.edu/masters_theses/1245